Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography [5853-112]
- 著者名:
- Yoshizawa, M. ( Sony Corp. (Japan) and IMEC (Belgium) )
- Philipsen, V.
- Leunissen, L. H. A. ( IMEC (Belgium) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5853
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 243
- 終了ページ:
- 251
- 総ページ数:
- 9
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- 言語:
- 英語
- 請求記号:
- P63600/5853
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
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2
国際会議録
Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
3
国際会議録
Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |