Evaluation of quartz dry etching profile for the PSM lithography performance [5853-109]
- 著者名:
Komizo, T. Nemoto, S. Kojima, Y. Ohshima, T. Yoshii, T. Konishi, T. Chiba, K. Kikuchi, Y. Otaki, M. Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5853
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 223
- 終了ページ:
- 233
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- 言語:
- 英語
- 請求記号:
- P63600/5853
- 資料種別:
- 国際会議録
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3
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Performance study of chromeless phase lithography mask for the 65nm node and beyond [6154-81]
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Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53]
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12
国際会議録
The study of optical performance for quartz dry etching quality in ArF lithography [6349-12]
SPIE - The International Society of Optical Engineering |