Correction of long-range effects applied to the 65-nm node [5853-107]

Correction of long-range effects applied to the 65-nm node [5853-107]

著者名:

Belledent, J. ( Philips Semiconductors (France) )

Word, J. ( Mentor Graphics Corp. (USA) )

Trouiller, Y. ( LETI-CEA (France) )

Couderc, C. ( Philips Semiconductors (France) )

Miramond, C. ( STMicroelectronics (France) )

Toublan, O. ( Mentor Graphics Europe (France) )

Chapon, J.-D.

Baron, S. ( STMicroelectronics (France) )

Borjon, A. ( Philips Semiconductors (France) )

Foussadier, F. ( STMicroelectronics (France) )

Gardin, C.

Lucas, K.

Patterson, K. ( Freescale (France) )

Rody, Y. ( Philips Semiconductors (France) )

Sundermann, F.

さらに 10 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5853

発行年:

2005

パート:

1

開始ページ:

202

終了ページ:

210

総ページ数:

9

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

言語:

英語

請求記号:

P63600/5853

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

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2 国際会議録 Through-process window resist modelling strategies for the 65 nm node [5992-46] Borjon, A., Belledent, J., Troullier, Y., Patterson, K., Lucas, K., Couderc, C., Sundermann, F., Urbani, J. -C., Baron, … SPIE - The International Society of Optical Engineering	8 国際会議録 Investigation of model-based physical design restrictions(Invited Paper) Lucas, K., Baron, S., Belledent, J., Boone, R., Borjon, A., Couderc, C., Patterson, K., Riviere-Cazaux, L., Rody, Y., … SPIE - The International Society of Optical Engineering
3 国際会議録 Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100] Couderc, C., Belledent, J., Borjon, A., Trouiller, Y., Sundermann, F., Lucas, K., Urbani, J.C., Foussadier, F., Rody, … SPIE - The International Society of Optical Engineering	9 国際会議録 OPC structures for maskshops qualification for the CMOS65nm and CMOS45nm nodes F. Sundermann, Y. Trouiller, J. Urbani, C. Couderc, J. Belledent, A. Borjon, F. Foussadier, C. Gardin, L. LeCam, Y. … SPIE - The International Society of Optical Engineering
4 国際会議録 Improving model-based OPC performance for the 65-nm node through calibration set optimization Patterson, K., Trouiller, Y., Lucas, K., Belledent, J., Borjon, A., Rody, Y., Couderc, C., Sundermann, F., Urbani, J. … SPIE - The International Society of Optical Engineering	10 国際会議録 Reticle enhancement verification for the 65nm and 45nm nodes [6156-58] Lucas, K., Patterson, K., Boone, R., Miramond, C., Borjon, A., Belledent, J., Toublan, O., Entradas, J., Trouiller, Y. SPIE - The International Society of Optical Engineering
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