Dual layer patterning failures in complex RET processes using ORC tools and pre- or post-optical proximity correction strategy [5853-100]
- 著者名:
Couderc, C. Belledent, J. Borjon, A. ( Philips Semiconductors (France) ) Trouiller, Y. ( CEA-LETI (France) ) Sundermann, F. ( STMicroelectronics (France) ) Lucas, K. ( Freescale Semiconductors (France) ) Urbani, J.C. Foussadier, F. ( STMicroelectronics (France) ) Rody, Y. ( Philips Semiconductors (France) ) Patterson, K. ( Freescale Semiconductors (France) ) Baron, S. ( STMicroelectronics (France) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 5853
- 発行年:
- 2005
- パート:
- 1
- 開始ページ:
- 141
- 終了ページ:
- 151
- 総ページ数:
- 11
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819458537 [0819458538]
- 言語:
- 英語
- 請求記号:
- P63600/5853
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
2
国際会議録
Improving model-based OPC performance for the 65-nm node through calibration set optimization
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Process window OPC verification: dry versus immersion lithography for the 65 nm node [6154-169]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |