Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]

Monitoring system of CD error analysis for the 90-nm node mask manufacturing [5853-11]

著者名:

Yu, S.-Y.

Han, W.-S. ( Samsung Electronics Co., Ltd. (South Korea) )

さらに 2 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

5853

発行年:

2005

パート:

1

開始ページ:

83

終了ページ:

89

総ページ数:

7

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819458537 [0819458538]

言語:

英語

請求記号:

P63600/5853

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016424
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2005 : 12th
会議開催地:	Yokohama, Japan
会議開催年:	2005.04.13-2005.04.15

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2 国際会議録 Analysis of mask CD error by dose modulation for fogging effect Lee, H., Yang, S.-H., Kim, B.-G., Moon, S.-Y., Choi, S.-W., Yoon, H.-S., Han, W.-S. SPIE - The International Society of Optical Engineering	8 国際会議録 Study of mask structure for 45-nm node based on manufacturability and lithographic performance J. G. Doh, C. H. Park, Y. S. Moon, B. H. Kim, S. W. Kwon, S. Y. Choi, S. H. Kim, S. Y. Kim, B. G. Kim, S. G. Woo, H. K. … SPIE - The International Society of Optical Engineering
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