Effects of TI addiction in WO3 thin film ammonia gas sensor prepared by dc reactive magnetron sputtering [6358-36]

Effects of TI addiction in WO3 thin film ammonia gas sensor prepared by dc reactive magnetron sputtering [6358-36]

著者名:

Hu, M. ( Tianjin Univ. (China) )

Yong, C. ( Tianjin Univ. (China) and Kim Check Univ. (South Korea) )

Wang, H. ( Tianjin Univ. (China) )

さらに 2 件

掲載資料名:

Sixth International Symposium on Instrumentation and Control Technology: Sensors, Automatic Measurement, Control, and Computer Simulation

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6358

発行年:

2006

パート:

1

開始ページ:

635810

終了ページ:

635810

総ページ数:

1

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464538 [0819464538]

言語:

英語

請求記号:

P63600/6358

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016360
シリーズID:	PA00000029
会議名:	International Symposium on Instrumentation and Control Technology
回次:	2006 : 6th
会議開催地:	Beijing, China
会議開催年:	2006.10.13-2006.10.15

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