A new critical dimension metrology for chrome-on-glass substrates based on S-parameter measurements extracted from coplanar waveguide test structures [6349-157]

A new critical dimension metrology for chrome-on-glass substrates based on S-parameter measurements extracted from coplanar waveguide test structures [6349-157]

著者名:

Nwokoye, C. A.
Zaghloul, M. ( George Washington Univ. (USA) )
Cresswell, M. W.
Allen, R. A.
Murabito, C. E. ( National Institute of Standards and Technology (USA) )

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

2

開始ページ:

634946

終了ページ:

634946

総ページ数:

1

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

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