Distributed computing in mask data preparation for 45-nm node and below [6349-142]

Distributed computing in mask data preparation for 45-nm node and below [6349-142]

著者名:

Zhang, W.
Sahouria, F.
Schulze, S. ( Mentor Graphics Corp. (USA) )

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

2

開始ページ:

63493T

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

類似資料:

1 国際会議録 Advanced mask process modeling for 45-nm and 32-nm nodes E. Tejnil, Y. Hu, E. Sahouria, S. Schulze, M. J. Tian Society of Photo-optical Instrumentation Engineers	7 国際会議録 Improvement of mask CD uniformity for below 45-nm node technology H. Lee, S. Bae, J. Park, D. Nam, B. Kim Society of Photo-optical Instrumentation Engineers
2 国際会議録 A user-programmable link between data preparation and mask manufacturing equipment W. Zhang, G. Davis, E. Sahouria, S. Schulze, M. Saad Society of Photo-optical Instrumentation Engineers	8 国際会議録 Extending OASIS for the unification of mask data representation Sahouria, E., Schulze, S., Suzuki, T., Hirumi, J. SPIE - The International Society of Optical Engineering
3 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering	9 国際会議録 The specification of the 45-nm node photomask repair process [6349-173] Sung, M. G., Huh, S., Cha, B. C., Choi, S., Han, W. SPIE - The International Society of Optical Engineering
4 国際会議録 OASIS-based unification of mask data representation Sahouria, E.Y., Schulze, S.F. SPIE - The International Society of Optical Engineering	10 国際会議録 Distributed processing in integrated data preparation flow Schulze, S. F., Bailey, G. E. SPIE - The International Society of Optical Engineering
5 国際会議録 Pattern based mask process correction: impact on data quality and mask writing time [5853-38] Sahouria, E., Bowhill, A., Schulze, S. SPIE - The International Society of Optical Engineering	11 国際会議録 Optimized distributed computing environment for mask data preparation [5992-41] Ahn, B. -S., Bang, J. -M., Ji, M. -K., Kang, S., Jang, S. -H., Choi, Y. -H., Ki, W. -T., Choi, S. -W., Han, W. -S. SPIE - The International Society of Optical Engineering
6 国際会議録 Required mask specification for mass production devices below 65-nm design node [6349-81] Nam, D., Choi, S., Doh, J., Noh, Y., Lee, H., Sin, Y., Kim, B., Kang, M., Han, W. SPIE - The International Society of Optical Engineering	12 国際会議録 Leap ahead in mask data processing for technology nodes below 130nm Miramond,C., Goubier,D., Chomat,M., Trouiller,Y., Rody,Y.F., Toublan,O. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12