Novel cleaning techniques to achieve defect-free photomasks for sub-65-nm nodes [6349-109]
- 著者名:
- Ryu, J. H.
- Lee, D. W.
- Ryu, J. S.
- Kim, S. P.
- Han, O. ( Hynix Semiconductor Inc. (South Korea) )
- 掲載資料名:
- Photomask Technology 2006
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6349
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 63492V
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819464446 [0819464449]
- 言語:
- 英語
- 請求記号:
- P63600/6349
- 資料種別:
- 国際会議録
類似資料:
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
12
国際会議録
Non-chemical cleaning technology for sub-90nm design node photomask manufacturing [6349-106]
SPIE - The International Society of Optical Engineering |