The study of chromeless phase lithography (CPL) for 45nm lithography [6349-98]

The study of chromeless phase lithography (CPL) for 45nm lithography [6349-98]

著者名:

Tan, S. Y.
Lin, Q. ( Chartered Semiconductor Manufacturing Ltd. (Singapore) )
Tay, C. J.
Quan, C. ( National Univ. of Singapore (Singapore) )

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

2

開始ページ:

63492O

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

類似資料:

1 国際会議録 Process window optimization of CPL mask for beyond 45nm lithography S. Y. Tan, Q. Lin, C. J. Tay, C. Quan SPIE - The International Society of Optical Engineering	7 国際会議録 Mask error enhancement factor for sub-0.13-μm lithography Tan,S.K., Lin,Q., Quan,C., Tay,C.J., See,A. SPIE-The International Society for Optical Engineering
2 国際会議録 MEF studies for attenuated phase-shift mask for sub-0.13-μm technology using 248 nm Tan, S.K., Lin, Q., Chua, G.S., Quan, C., Tay, C.J. SPIE-The International Society for Optical Engineering	8 国際会議録 Application of chromeless phase lithography (CPL) masks in ArF lithography Kasprowicz, B.S., Progler, C.J., Wu, W., Conley, W., Litt, L.C., Van Den Broeke, D.J., Wampler, K.E., Socha, R.J. SPIE-The International Society for Optical Engineering
3 国際会議録 A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography M. L. Ling, G. S. Chua, C. J. Tay, C. Quan, Q. Lin SPIE - The International Society of Optical Engineering	9 国際会議録 Impact of transmission error for attenuated phase-shift mask for 0.10-μm technology Tan, S.K., Lin, Q., Quan, C., Tay, C.J. SPIE-The International Society for Optical Engineering
4 国際会議録 Study of dry etching pattern profile of chromeless phase lithography (CPL) mask Lin, J., Hsu, M., Hsu, T., Hsu, S.D., Shi, X., Van Den Broeke, D.J., Chen, J.F., Tang, F.C., Hsieh, W.A., Huang, C.Y. SPIE - The International Society of Optical Engineering	10 国際会議録 Patterning half-wavelength DRAM cell using chromeless phase lithography (CPL) Hsu, C., Chu, R., Chen, J.F., Van Den Broeke, D.J., Shi, X., Hsu, S.D., Wang, T. SPIE-The International Society for Optical Engineering
5 国際会議録 Customized illumination shapes for 193nm immersion lithography M. L. Ling, G. S. Chua, Q. Lin, C. J. Tay, C. Quan Society of Photo-optical Instrumentation Engineers	11 国際会議録 Tuning MEEF for CD control at 65-nm node based on chromeless phase lithography (CPL) Van Den Broeke, D.J., Laidig, T.L., Wampler, K.E., Hsu, S., Shi, X., Hsu, M., Burchard, P., Chen, J.F. SPIE-The International Society for Optical Engineering
6 国際会議録 Dipole options for 90-nm lithography technologies and below Chua, G.S., Tay, C.J., Quan, C., Lin, Q., Chua, L.-H. SPIE-The International Society for Optical Engineering	12 国際会議録 Phase defect repair for the chromeless phase lithography (CPL) mask Fan, S., Hsu, M., Tseng, A., Chen, J.F., Van Den Broeke, D.J., Lei, H., Hsu, S., Shi, X. SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12