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NIL template making and imprint evaluation [6349-85]

著者名:
Yoshida, Y.
Kobiki, A.
Hiraka, T.
Yusa, S.
Sasaki, S.
Itoh, K.
Toyama, N.
Kurihara, M.
Mohri, H.
Hayashi, N. ( Dai Nippon Printing Co., Ltd. (Japan) )
さらに 5 件
掲載資料名:
Photomask Technology 2006
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6349
発行年:
2006
パート:
1
開始ページ:
63492C
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
言語:
英語
請求記号:
P63600/6349
資料種別:
国際会議録

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