High-transmission attenuated phase-shift mask for ArF immersion lithography [6349-68]

High-transmission attenuated phase-shift mask for ArF immersion lithography [6349-68]

著者名:

Kojima, Y.
Mizoguchi, T.
Haraguchi, T.
Konishi, T.
Okuda, Y. ( Toppan Printing Co., Ltd. (Japan) )

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

1

開始ページ:

63491V

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

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1 国際会議録 Study of mask induced polarization effects on att. PSM in immersion lithography [6283-121] Mizoguchi, T., Kojima, Y., Takagi, M., Saga, T., Haraguchi, T., Konishi, T., Fukushima, Y., Tanaka, T., Okuda, Y. SPIE - The International Society of Optical Engineering	7 国際会議録 Evaluating films for high transmission attenuated phase shift masks [6283-33] Nemoto, S., Komizo, T., Kikuchi, Y., Gallagher, E., Benz, J., Hibbs, M., Haraguchi, T. SPIE - The International Society of Optical Engineering
2 国際会議録 Improvement of CD variation control for attenuated phase-shift mask M. Takagi, T. Mizoguchi, Y. Kojima, T. Saga, T. Haraguchi, Y. Fukushima, T. Tanaka, Y. Okuda, Y. Inazuki, H. Yoshikawa, … SPIE - The International Society of Optical Engineering	8 国際会議録 ZrSiO:a new and robust material for attenuated phase-shift mask in ArF Lithography Onodera,T., Matsuo,T., Nakazawa,K., Miyazaki,J., Ogawa,T., Morimoto,H., Haraguchi,T., Fukuhara,N., Otaki,M., Takeuchi,S. SPIE - The International Society for Optical Engineering
3 国際会議録 Study of alternating phase shift mask structures for ArF lithography Kojima, Y., Konishi, T., Sasaki, J., Tanaka, K., Komizo, T., Morita, M., Shirasaki, M., Ohshima, T., Takahashi, H., … SPIE - The International Society of Optical Engineering	9 国際会議録 Attenuated phase-shifting mask in ArF lithography Miyazaki, J., Uematsu, M., Nakazawa, K., Matsuo, T., Onodera, T., Ogawa, T. SPIE - The International Society of Optical Engineering
4 国際会議録 Realization of mass prouction for 130-nm node and future application for high transmission using ZrSi-based attenuated phase-shift mask in ArF lithography Ii,T., Saga,T., Hattori,Y., Ohshima,T., Otaki,M., Iwakata,M., Haraguchi,T., Kanayama,K., Yamazaki,T., Fukuhara,N., … SPIE-The International Society for Optical Engineering	10 国際会議録 Materials for an attenuated phase-shifting mask in 157-nm lithography Matsuo,T., Onodera,T., Itani,T., Morimoto,H., Haraguchi,T., Kanayama,K., Otaki,M. SPIE-The International Society for Optical Engineering
5 国際会議録 Development of ZrSiO attenuated phase-shift mask for ArF excimer laser lithography Fukuhara,N., Haraguchi,T., Kanayama,K., Matsuo,T., Takeuchi,S., Tomiyama,K., Saga,T., Hattori,Y., Ooshima,T., Otaki,M. SPIE - The International Society for Optical Engineering	11 国際会議録 Imaging behavior of high-transmission attenuating phase-shift mask films [6349-45] Hibbs, M., Nemoto, S., Komizo, T. SPIE - The International Society of Optical Engineering
6 国際会議録 Through-pitch anf through-focus characterization of AAPSM for ArF immersion lithography [6281-53] Konishi, T., Kojima, Y., Okuda, Y., Philipsen, V., Leunissen, A. H. L., Van Look, L. SPIE - The International Society of Optical Engineering	12 国際会議録 CrOxFy as a material for attenuated phase-shift masks in ArF lithography Nakazawa,K., Matsuo,T., Onodera,T., Morimoto,H., Mohri,H., Hatsuta,C., Hayashi,N. SPIE - The International Society for Optical Engineering

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