Feasibility study of mask fabrication in double exposure technology [6349-67]

Feasibility study of mask fabrication in double exposure technology [6349-67]

著者名:

Doh, J. G.

Han, W. S. ( Samsung Electronics Co., Ltd. (South Korea) )

さらに 3 件

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

1

開始ページ:

63491U

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

類似資料:

1 国際会議録 Study of the beam blur and its effect on the future mask fabrication [6349-33] Lee, S., Park, S., Ahn, M., Doh, J., Kim, S., Kim, B., Choi, S., Han, W. SPIE - The International Society of Optical Engineering	7 国際会議録 Study of mask structure for 45-nm node based on manufacturability and lithographic performance J. G. Doh, C. H. Park, Y. S. Moon, B. H. Kim, S. W. Kwon, S. Y. Choi, S. H. Kim, S. Y. Kim, B. G. Kim, S. G. Woo, H. K. … SPIE - The International Society of Optical Engineering
2 国際会議録 Required mask specification for mass production devices below 65-nm design node [6349-81] Nam, D., Choi, S., Doh, J., Noh, Y., Lee, H., Sin, Y., Kim, B., Kang, M., Han, W. SPIE - The International Society of Optical Engineering	8 国際会議録 Mask technology for 0.18-ｦﾌm device generation Sohn,J.M., Choi,S.W., Kim,B.G., Cho,H.K., Yoon,H.S. SPIE-The International Society for Optical Engineering
3 国際会議録 EUV mask pattern inspection for memory mask fabrication in 45-nm node and below [6349-95] Kim, D. Y., Cho, S. Y., Kim, H., Huh, S. M., Chung, D. H., Cha, B. C., Lee, J. W., Choi, S. W., Han, W. S., Park, K. H., … SPIE - The International Society of Optical Engineering	9 国際会議録 Vacuum delay effect of CAR in mask fabrication Kim,C.-H., Jeon,C.-U., Han,S.-J., Cho,W.-I., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering
4 国際会議録 Study of Cr patch validity for ArF CPL mask and its fabrication Kim, C.-H., Kim, S.-H., Lee, M.-S., Park, J.-S., Shin, I.-G., Choi, S.-W., Yoon, H.-S., Han, W.-S. SPIE - The International Society of Optical Engineering	10 国際会議録 A study of post-exposure baking effect for CAR process in photomask fabrication Park, D.-I., Seo, S.-K., Jeong, W.-G., Park, E.-S., Lee, J.-H., Kwon, H.-J., Kim, J.-M., Jung, S.-M., Choi, S.-S. SPIE-The International Society for Optical Engineering
5 国際会議録 Analysis of dry etch loading effect in mask fabrication Lee,J.-Y., Cho,S.-Y., Kim,C.-H., Lee,S.-W., Choi,S.-W., Han,W.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering	11 国際会議録 Analysis of mask CD error by dose modulation for fogging effect Lee, H., Yang, S.-H., Kim, B.-G., Moon, S.-Y., Choi, S.-W., Yoon, H.-S., Han, W.-S. SPIE - The International Society of Optical Engineering
6 国際会議録 Mask fabrication results using new laser writing system: Sigma7300 [6283-14] Lee, -J. H., Nam, -S. D., Lee, -H. S., Kim, -S. H., Han, -S. H., Kim, -G. B., Choi, -W. S., Han, -S. W. SPIE - The International Society of Optical Engineering	12 国際会議録 Doubly exposed patterning characteristics using two alternating phase-shift masks Lee,S.-W., Shin,I.-G., Kim,Y.-H., Choi,S.-W., Han,W.-S., Yoon,H.-S., Sohn,J.-M. SPIE-The International Society for Optical Engineering

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