Sensitivity of a variable threshold model toward process and modeling parameters [6349-44]

Sensitivity of a variable threshold model toward process and modeling parameters [6349-44]

著者名:

Saied, M. ( Freescale Semiconductor, Inc. (France) )

Foussadier, F. ( STMicroelectronics (France) )

Trouiller, Y. ( LETI-CEA (France) )

Belledent, J. ( Philips Semiconductors (France) )

Lucas, K. ( Freescale Semiconductor, Inc. (France) )

Schanen, I. ( IMEP (France) )

Borjon, A.

Couderc, C. ( Philips Semiconductors (France) )

Gardin, C. ( Freescale Semiconductor, Inc. (France) )

LeCam, L.

Rody, Y. ( Philips Semiconductors (France) )

Sundermann, F.

Urbani, J.-C. ( STMicroelectronics (France) )

Yesilada, E. ( Freescale Semiconductor, Inc. (France) )

さらに 9 件

掲載資料名:

Photomask Technology 2006

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6349

発行年:

2006

パート:

1

開始ページ:

634919

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464446 [0819464449]

言語:

英語

請求記号:

P63600/6349

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016353
シリーズID:	PA00000029
会議名:	SPIE Photomask Technology : Annual BACUS Symposium on Photomask Technology
回次:	2006 : 26th
会議開催地:	Monterey, CA, USA
会議開催年:	2006.09.19-2006.09.22

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