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Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 [6349-36]

著者名:
Huckabay, J.
Staud, W.
Naber, R. ( Cadence Design Systems, Inc. (USA) )
van Oosten, A. ( ASML, Inc. (Netherlands) )
Nikolski, P.
Hsu, S.
Socha, R. J.
Dusa, M. V.
Flagello, D. ( ASML, Inc. (USA) )
さらに 4 件
掲載資料名:
Photomask Technology 2006
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6349
発行年:
2006
パート:
1
開始ページ:
634910
終了ページ:
634911
総ページ数:
2
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819464446 [0819464449]
言語:
英語
請求記号:
P63600/6349
資料種別:
国際会議録

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