In situ infrared absorption spectroscopy for thin film growth by atomic layer deposition (Invited Paper) [6325-16]

In situ infrared absorption spectroscopy for thin film growth by atomic layer deposition (Invited Paper) [6325-16]

著者名:

Wang, Y.
Dai, M.
Rivilon, S.
Ho, M.-T.
Chabal, Y. J. ( Rutgers Univ. (USA) )

掲載資料名:

Physical Chemistry of Interfaces and Nanomaterials V

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6325

発行年:

2006

開始ページ:

63250G

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819464040 [081946404X]

言語:

英語

請求記号:

P63600/6325

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016331
シリーズID:	PA00000029
会議名:	Optics & Photonics : Physical Chemistry of Interfaces and Nanomaterials
回次:	2006 : 5th
会議開催地:	San Diego, CA, USA
会議開催年:	2006.08.15-2006.08.17

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