Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]

Fine pixel SEM image for mask pattern quality assurance based on lithography simulation [6283-48]

著者名:

Yamanaka, E.

Itoh, M. ( Toshiba Corp. (Japan) )

Kobayashi, H.

Kawashima, T.

Narukawa, S. ( Dai Mippon Printing Corp. (Japan) )

さらに 4 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6283

発行年:

2006

パート:

2

開始ページ:

62832E

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463586 [0819463582]

言語:

英語

請求記号:

P63600/6283

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016290
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2006 : 13th
会議開催地:	Yokohama, Japan
会議開催年:	2006.04.18-2006.04.20

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4 国際会議録 Accuracy of mask pattern contour extraction with fine-pixel SEM images S. Yamaguchi, E. Yamanaka, H. Mukai, T. Kotani, H. Mashita Society of Photo-optical Instrumentation Engineers	10 国際会議録 A study of mask specification in spacer patterning technology H. Mukai, Y. Kobayashi, S. Yamaguchi, K. Kawano, K. Hashimoto Society of Photo-optical Instrumentation Engineers
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