Quartz etch challenges for 45 nm phase-shift masks [6283-28]

Quartz etch challenges for 45 nm phase-shift masks [6283-28]

著者名:

Anderson, A. S.

Kumar, A. ( Applied Materials Inc. (USA) )

さらに 2 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6283

発行年:

2006

パート:

2

開始ページ:

62831X

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463586 [0819463582]

言語:

英語

請求記号:

P63600/6283

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016290
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2006 : 13th
会議開催地:	Yokohama, Japan
会議開催年:	2006.04.18-2006.04.20

類似資料:

1 国際会議録 Quartz etch solutions for 45-nm phase-shift masks [6349-119] Chandrachood, M., Grimbergen, M., Leung, T. Y. B., Panayil, S., Ibrahim, I., Kumar, A. SPIE - The International Society of Optical Engineering	7 国際会議録 Mask etcher data strategy for 45 nm and beyond [6283-26] Lewington, R., Ibrahim, M. I., Panayil, S., Kumar, A., Yamartino, J. SPIE - The International Society of Optical Engineering
2 国際会議録 Chrome etch challenges for 45 nm and beyond [6283-27] Chandrachood, M., Grimbergen, M., Ibrahim, M. I., Panayil, S., Kumar, A. SPIE - The International Society of Optical Engineering	8 国際会議録 Exploring the 65nm frontier of alternating phase shifting masks with a quartz dry etch chemistry S.A. Anderson, R. Neubauer, A. Kumar, I. Ibrahim SPIE - The International Society of Optical Engineering
3 国際会議録 Overcoming loading challenges in a mask etcher for 45 nm and beyond M. Chandrachood, T. Y. B. Leung, K. Yu, M. Grimbergen, S. Panayil Society of Photo-optical Instrumentation Engineers	9 国際会議録 Optimization of a 65-nm alternating phase-shift quartz etch process Anderson, S.A., Anderson, S.A., III, Buie, M.J., Chandrachood, M., Clevenger, J.O., Lee, Y., Sandlin, N.L., Ding, J. SPIE - The International Society of Optical Engineering
4 国際会議録 Photomask etch challenges for futute technology nodes [6283-132] Chandrachood, M., Grimbergen, M., Leung, B. Y. T., Koch, R. Yu. K., Chen, J., Ibrahim, M. I., Panayil, S., Kumar, A. SPIE - The International Society of Optical Engineering	10 国際会議録 Evaluation of quartz dry etching performance for next generation phase-shift mask applications [5992-27] Anderson, S. A., Konishi, T., Koch, R., Yokoi, S., Kumar, A., Ibrahim, I. SPIE - The International Society of Optical Engineering
5 国際会議録 Overcoming mask etch challenges for 45 nm and beyond M. Chandrachood, T. Y. B. Leung, K. Yu, M. Grimbergen, S. Panoyil Society of Photo-optical Instrumentation Engineers	11 国際会議録 Photomask etch and profile control of 65nm chromeless phase lithography masks using scanning probe metrology [5853-58] Anderson, S. A., Buxbaum, A., Kumar, A., Ibrahim, I. SPIE - The International Society of Optical Engineering
6 国際会議録 Chrome etch solutions for 45-nm and beyond [6349-118] Chandrachood, M., Grimbergen, M., Ibrahim, I., Panayil, S., Kumar, A. SPIE - The International Society of Optical Engineering	12 国際会議録 A novel process of etching EUV masks for future generation technology [6349-201] Wu, B., Kumar, A., Chandrachood, M., Ibrahim, I., Sabharwal, A. SPIE - The International Society of Optical Engineering

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