A study for effect of rounded contact hole pattern by laser mask writng machine onto wafer process margin [6283-15]
- 著者名:
Park, -J. S. Yoon, -H. K. Kang, -H. J. Choi, -Y. J. Lee, -S. Y. Kim. K. ( Dongbu Electronics (South Korea) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6283
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 62831K
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- 言語:
- 英語
- 請求記号:
- P63600/6283
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
4
国際会議録
Evaluation of litho printability of DRAM contact hole patterns with various programmed defects
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |