Extended process window using variable transmission PSM materials for 65 nm and 45 nm node [6283-120]
- 著者名:
Koepernik, C. ( IMS Chips (Germany) ) Becker, H. ( Schott Lithotec (Germany) ) Brikner, R. ( Carl Zeiss SMS GmbH (Germany) ) Buttgereit, U. ( Schott Lithotec (Germany) ) Irmscher, M. Nedelmann, L. ( IMS Chips (Germany) ) Zibold, A. ( Carl Zeiss SMS GmbH (Germany) ) - 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6283
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 62831D
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- 言語:
- 英語
- 請求記号:
- P63600/6283
- 資料種別:
- 国際会議録
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Development of a new PSM film system for 157-nm extensible to high-transmission 193 nm lithography
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Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
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