RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]

RET masks for petterning 45nm node contact hole using ArF immersion lithography [6283-114]

著者名:

Hsu, M.

Chen, F. J.

Van Den Broeke, D. ( ASML MaskTools, Inc. (USA) )

En Tszng, S.

Shieh, J. ( ASML TDC Taiwan (Taiwan) )

Hsu, S.

Shi, X. ( ASML MaskTools, Inc. (USA) )

さらに 2 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6283

発行年:

2006

パート:

1

開始ページ:

628317

終了ページ:

628317

総ページ数:

1

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463586 [0819463582]

言語:

英語

請求記号:

P63600/6283

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016290
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2006 : 13th
会議開催地:	Yokohama, Japan
会議開催年:	2006.04.18-2006.04.20

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2 国際会議録 Contact and via hole mask design optimization for 65-nm technology node Van Den Broeke, D., Shi, X., Socha, R., Laidig, T., Hollerbach, U., Wampler, K. E., Hsu, S., Chen, J. F., Corcoran, N. … SPIE - The International Society of Optical Engineering	8 国際会議録 Mask design optimization for 70-nm technology node using chromeless phase lithography (CPL) based on 100% transmission phase-shifting mask Chen, J.F., Van Den Broeke, D.J., Hsu, M., Laidig, T.L., Wampler, K.E., Shi, X., Hsu, S., Shafer, T. SPIE-The International Society for Optical Engineering
3 国際会議録 Patterning 45nm flash/DRAM contact hole mask with hyper-NA immersion lithography and optimized illumination [6154-60] Chen, T., Van Den Broeke D, Hsu, S, Park S, Berger G, Coskun T, De Vocht J, Corcoran N, Chen F, Van der Heijden, Finders … SPIE - The International Society of Optical Engineering	9 国際会議録 Implementation of random contact hole design with CPL mask by using IML technology [5992-108] Hsu, M., Van Den Broeke, D., Hsu, S., Chen, J. F., Shi, X., Corcoran, N., Yu, L. SPIE - The International Society of Optical Engineering
4 国際会議録 Feasibility study of double exposure lithography for 65nm and 45nm node [5853-114] Hsu, S., Van Den Broeke, D., Chen, J. F., Park, J., Hsu, M. C. W. SPIE - The International Society of Optical Engineering	10 国際会議録 RET masks for the final frontier of optical lithography [5853-104] Chen, J. F., Broeke, D. van den, Hsu, S., Hsu, M. C.W., Laidig, T., Shi, X., Chen, T., Socha, R. J., Hollerbach, U., … SPIE - The International Society of Optical Engineering
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