Highly accurate modeling by using 2-dimensional calibration data set for model-based OPC verification [6283-104]
- 著者名:
- Kim, -K. C.
- Choi, -S. J.
- Nam, -H. B.
- Yim, D. ( Hynix Semiconductor Inc. (South Korea) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6283
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 62830V
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- 言語:
- 英語
- 請求記号:
- P63600/6283
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Accurate gate CD control through the full-chip area using the dual model in the model-based OPC
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Methodology to set up accurate OPC model using optical CD metrology and atomic force microscopy
SPIE - The International Society of Optical Engineering |