Automatic pitch decomposition for improved process window when printing dense features at keff

Automatic pitch decomposition for improved process window when printing dense features at keff<0.20 [6283-102]

著者名:

Huckabay, J.

Staud, W.

Naber, R. ( Cadence Design Systems, Inc. (USA) )

Dusa, M.

Flagello, D.

Socha, R. ( ASML (USA) )

さらに 1 件

掲載資料名:

Photomask and Next-Generation Lithography Mask Technology XIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6283

発行年:

2006

パート:

1

開始ページ:

62830T

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819463586 [0819463582]

言語:

英語

請求記号:

P63600/6283

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016290
シリーズID:	PA00000029
会議名:	Photomask and next-generation lithography mask technology
回次:	2006 : 13th
会議開催地:	Yokohama, Japan
会議開催年:	2006.04.18-2006.04.20

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