Automated hot-spot fixing system applied for metal layers of 65 nm logic devices [6283-101]
- 著者名:
- Kobayashi, S.
- Kyoh, S.
- Kotani, T.
- Tanaka, S.
- Inoue, S. ( Toshiba Corp. (Japan) )
- 掲載資料名:
- Photomask and Next-Generation Lithography Mask Technology XIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6283
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 62830R
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463586 [0819463582]
- 言語:
- 英語
- 請求記号:
- P63600/6283
- 資料種別:
- 国際会議録
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4
国際会議録
Hierarchical processing for accurate optical proximity correction for 1-Gb DRAM metal layers
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