Spot sensor enanled reticle uniformity measurements for 65 nm CDU analysis with scatterometry [6281-18]
- 著者名:
- Janssen, M.
- van Ingen Schenau, K.
- van der Laan, H. ( ASML Netherlands B.V. (Netherlands) )
- 掲載資料名:
- EMLC 2006 : 22nd European Mask and Lithography Conference : 23-26 January 2006, Dresden, Germany
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6281
- 発行年:
- 2006
- 開始ページ:
- 62810F
- 出版情報:
- Bellingham, Wash.,: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819463562 [0819463566]
- 言語:
- 英語
- 請求記号:
- P63600/6281
- 資料種別:
- 国際会議録
類似資料:
1
国際会議録
Scatterometry based 65nm node CDU analysis and prediction using novel reticle measurement technique
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |