Combined use of x-ray reflectometry and spectroscopic ellipsometry for characterization of thin film optical properties [6155-25]
- 著者名:
- Cain, J. P. ( Advanced Micro Devices (USA) )
- Robie, S. ( Sponsion (USA) )
- Zhang, Q. ( Advanced Micro Devices (USA) )
- Singh, B. ( Advanced Micro Devices (USA) )
- Emami, I. ( Advanced Micro Devices (USA) )
- 掲載資料名:
- Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6155
- 発行年:
- 2006
- 開始ページ:
- 61550P
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461988 [0819461989]
- 言語:
- 英語
- 請求記号:
- P63600/6155
- 資料種別:
- 国際会議録
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12
国際会議録
Application of spectroscopic ellipsometry to characterization of optical thin films (Invited Paper)
SPIE-The International Society for Optical Engineering |