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Improvement of OPC accuracy for 65nm node contact using KIF [6155-22]

著者名:
Wu, T. H. ( United Microelectronics Corp. (Taiwan) )
Lin, C. L. ( United Microelectronics Corp. (Taiwan) )
Chen, M. J. ( United Microelectronics Corp. (Taiwan) )
Tsai, Z. H. ( United Microelectronics Corp. (Taiwan) )
Ao, C. Y. ( United Microelectronics Corp. (Taiwan) )
Thung, H. C. ( United Microelectronics Corp. (Taiwan) )
Liou, J. S. ( United Microelectronics Corp. (Taiwan) )
Yang, C. H. ( United Microelectronics Corp. (Taiwan) )
Lin, L. C. ( United Microelectronics Corp. (Taiwan) )
さらに 4 件
掲載資料名:
Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6155
発行年:
2006
開始ページ:
61550M
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461988 [0819461989]
言語:
英語
請求記号:
P63600/6155
資料種別:
国際会議録

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