Spatial modeling of micron-scale gate length variation [6155-10]

Spatial modeling of micron-scale gate length variation [6155-10]

著者名:

Friedberg, P. ( Univ. of California, Berkeley (USA) )
Cheung, W. ( Univ. of California, Berkeley (USA) )
Spanos, C. J. ( Univ. of California, Berkeley (USA) )

掲載資料名:

Data analysis and modeling for process control III : 23 February, 2006, San Jose, California, USA

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6155

発行年:

2006

開始ページ:

61550C

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461988 [0819461989]

言語:

英語

請求記号:

P63600/6155

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016187
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Data Analysis and Modeling for Process Control
回次:	2006 : 3rd
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.23

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