Systematic optimization of the thin-film stack by minimizing CD sensitivity [6154-154]

Systematic optimization of the thin-film stack by minimizing CD sensitivity [6154-154]

著者名:

Lin, S. S. ( Tauwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Lin, B. J. ( Tauwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Yen, A. ( Tauwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )
Ke, C. -M. ( Tauwan Semiconductor Manufacturing Co., Ltd. (Taiwan) )

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

3

開始ページ:

615440

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

類似資料:

1 国際会議録 Effect of various ArF resist shrinkage amplitudes on CD bias Ke, C.-M., Gau, T.-S., Chen, P.-H., Yen, A., Lin, B.J., Otaka, T., Iizumi, T., Sasada, K., Ueda, K. SPIE-The International Society for Optical Engineering	7 国際会議録 Sensitivity of a Rotating Beam Sensor for Stress Evaluation in Aluminum Thin Films Santos, J. M. M. dos, Pina, J. C. P., Batista, A. C., Horsfall, A. B., Wang, K., Wright, N. G., Soare, S. M., Bull, S. … Trans Tech Publications
2 国際会議録 Improved resist profiles and CD control through optimized thin dielectric stacks C.F. Lyons, M. Agrawal, B. Singh Society of Photo-optical Instrumentation Engineers	8 国際会議録 Characterization of Highly Textured PZT Thin Films Grown on LaNiO3 Coated Si Substrates by MOCVD Lin, C. H., Yen, B. M., Chen, Haydn, Wu, T. B., Kuo, H. C., Stillman, G. E. MRS - Materials Research Society
3 国際会議録 Quantification of CD-SEM wafer global charging effect on CD and CD uniformity of 193-nm lithography Ke, C.-M., Hung, H.-L., Chang, A., Chen, J.-H., Gau, T.-S., Ku, Y.-C., Lin, B.J., Otaka, T., Ueda, K., Kawada, H., … SPIE - The International Society of Optical Engineering	9 国際会議録 When is bilayer thin-film imaging suitable: comparison with single-layer resists Halle,S., Thomas,A.C., Armacost,M., Dalton,T.J., Chen,X.L., Bukofsky,S.J., Genz,O., Lu,Z.G., Butt,S.A., Chen,Z., … SPIE-The International Society for Optical Engineering
4 国際会議録 Minimization of Solvent Utilization Using Physicochemical Test Kits Rahman, M. A., Tarrer, A. R., Guin, J. A., Yen, S. C., Joshi, S. B. American Institute of Chemical Engineers	10 国際会議録 Methodology to set up mask CD specification including MEEF and process sensitivity of mask CD error [6154-167] Shim, Y. A., Park, S. J., Kim, J.-H., Kim, K. SPIE - The International Society of Optical Engineering
5 国際会議録 OCD metrology by floating n/k S. Yu, J. Huang, C. Ke, T. Gau, B. J. Lin, A. Yen, L. Lane, V. Vuong, Y. Chen SPIE - The International Society of Optical Engineering	11 国際会議録 ArF scanner performance improvement by using track integrated CD optimization [6152-80] Huang, J., Yu, S. S, Ke, C M, Wu, T, Wang, Y. H, Gau, T S, Wang, D, Li, A, Yang, W, Kaoru, A SPIE - The International Society of Optical Engineering
6 国際会議録 Application of scatterometry for CD and profile metrology in 193-nm lithography process development Chen, L.-J., Ke, C.-M., Yu, S.S., Gau, T.-S., Chen, P., Ku, Y.-C., Lin, B.J., Engelhard, D., Hetzer, D., Yang, J.Y., … SPIE-The International Society for Optical Engineering	12 国際会議録 Integration of the reticle systematic CD errors into an OPC modeling and correction [6154-136] Han, G., Mansfield, S., Krasnoperova, A. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12