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Process window OPC for reduced process variability and enhanced yield [6154-139]

著者名:
Krasnoperova, A. ( IBM Systems and Technology Group (USA) )
Culp, J. A. ( IBM Systems and Technology Group (USA) )
Graur, I. ( IBM Systems and Technology Group (USA) )
Mansfield, S. ( IBM Systems and Technology Group (USA) )
Al-Imam, M. ( Mentor Graphics Corp. (Egypt) )
Maaty, H. ( Mentor Graphics Corp. (Egypt) )
さらに 1 件
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
3
開始ページ:
61543L
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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