Efficient OPC model generation and verification for focus variation [6154-128]
- 著者名:
Park, Y. H. ( Samsung Electronics Co, Ltd. (South Korea) ) Ban, Y. C. ( Samsung Electronics Co, Ltd. (South Korea) ) Hur, D. H. ( Samsung Electronics Co, Ltd. (South Korea) ) Kim, D. -H. ( Samsung Electronics Co, Ltd. (South Korea) ) Hong, J. -S. ( Samsung Electronics Co, Ltd. (South Korea) ) Yoo, M. -H. ( Samsung Electronics Co, Ltd. (South Korea) ) Kong, J. T. ( Samsung Electronics Co, Ltd. (South Korea) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 3
- 開始ページ:
- 61543B
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
7
国際会議録
Simulation-based critical-area extraction and litho-friendly layout design for low-k1 lithography
SPIE - The International Society of Optical Engineering |
2
国際会議録
Accurate gate CD control through the full-chip area using the dual model in the model-based OPC
SPIE - The International Society of Optical Engineering |
8
国際会議録
Efficient mask data preparation for variable shaped e-beam writing system focusing on memory devices
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
5
国際会議録
MEEF-based correction to achieve OPC convergence of low-kl lithography with strong OAI [6154-25]
SPIE - The International Society of Optical Engineering |
11
国際会議録
DFM based on layout restriction and process window verification for sub-60nm memory devices
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |