Analysis of the combined impact of the laser spectrum, illuminator miscalibrations, and lens aberrations on the 90 nm technology node imaging with off-axis illuminations [6154-118]

Analysis of the combined impact of the laser spectrum, illuminator miscalibrations, and lens aberrations on the 90 nm technology node imaging with off-axis illuminations [6154-118]

著者名:

Loi S ( STMicroelectronics (Italy) )
Lessi U ( STMicroelectronics (Italy) )
Chung R ( Litel Instruments (USA) )

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

3

開始ページ:

615434

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

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