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Effect of lens aberrations on OPC model accuracy for low kl lithography process [6154-116]

著者名:
  • Ahn J. K ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Jeong C. Y ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Park J.-L ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Choi J.-S ( MagnaChip Semiconductor Ltd. (South Korea) )
  • Lee J.-G ( MagnaChip Semiconductor Ltd. (South Korea) )
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
3
開始ページ:
615432
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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