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Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]

著者名:
Kwak, E. A. ( Hanyang Univ. (South Korea) )
Jung, M. R. ( Hanyang Univ. (South Korea) )
Kim, D.-G. ( Hanyang Univ. (South Korea) )
Lee, J.-E. ( Hanyang Univ. (South Korea) )
Oh, H.-K. ( Hanyang Univ. (South Korea) )
Lee, S. ( Samsung Electronics (South Korea) )
さらに 1 件
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
2
開始ページ:
61542T
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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