Heterogeneous diffusion model for simulation of resist process [6154-104]
- 著者名:
- Lim, C. M. ( Hynix Semiconductor Inc. (South Korea) )
- Park, J. T. ( Hynix Semiconductor Inc. (South Korea) )
- Kim, S. M. ( Hynix Semiconductor Inc. (South Korea) )
- Kim, H. S. ( Hynix Semiconductor Inc. (South Korea) )
- Moon, S. C. ( Hynix Semiconductor Inc. (South Korea) )
- 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61542S
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
8
国際会議録
Diffusion parameter analysis for chemical amplification resists as a function of resist process
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
10
国際会議録
Compensation of intrafield registration error caused by process properties in optical lithography
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |