Early learning on hyper-NA lithography using two-beam immersion interference [6154-70]
- 著者名:
Hendrickx, E. ( IMEC (Belgium) ) Op de Beeck, M. ( IMEC (Belgium) ) Gronheid, R. ( IMEC (Belgium) ) Versluijs, J. ( IMEC (Belgium) ) Van Look, L. ( IMEC (Belgium) ) Ercken, M. ( IMEC (Belgium) ) Vandenberghe, G. ( IMEC (Belgium) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61541X
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
2
国際会議録
Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
4
国際会議録
Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123]
SPIE - The International Society of Optical Engineering |
10
国際会議録
Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
12
国際会議録
Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials
Society of Photo-optical Instrumentation Engineers |