Mask topography effect on OPC at hyper NA lithography [6154-64]
- 著者名:
Lee S ( Samsung Electronics Co. Ltd. (South Korea) ) Kim I. S ( Samsung Electronics Co. Ltd. (South Korea) ) Chun Y. J ( Samsung Electronics Co. Ltd. (South Korea) ) Kim S.-W ( Samsung Electronics Co. Ltd. (South Korea) ) Lee S.J ( Samsung Electronics Co. Ltd. (South Korea) ) Wood, S.-G ( Samsung Electronics Co. Ltd. (South Korea) ) Cho H. K ( Samsung Electronics Co. Ltd. (South Korea) ) Moon J.-T ( Samsung Electronics Co. Ltd. (South Korea) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61541R
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
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