Dynamic leaching procedure on an immersion interference printer [6154-186]

Dynamic leaching procedure on an immersion interference printer [6154-186]

著者名:

Gronheid, R. ( IMEC vzw (Belgium) )
Tenaglia, E. ( IMEC (Belgium) and STMicroelectronics (France) )
Ercken, M. ( IMEC vzw (Belgium) )

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

2

開始ページ:

61541I

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

類似資料:

1 国際会議録 Early learning on hyper-NA lithography using two-beam immersion interference [6154-70] Hendrickx, E., Op de Beeck, M., Gronheid, R., Versluijs, J., Van Look, L., Ercken, M., Vandenberghe, G. SPIE - The International Society of Optical Engineering	7 国際会議録 A dive into clear water: immersion defect capabilities [6154-28] Streefkerk, B., Nulkens, J., Moerman, R., Stacenga, M., Van der Hoeven, J., Grouwstra, C., Bruis, R., Leenders, M., … SPIE - The International Society of Optical Engineering
2 国際会議録 Immersion specific defect mechanisms: findings and recommendations for their control [6154-180] Kocsis, M., Van Den Heuvel, D., Gronheid, R., Maenhoudt, M., Vangoidsenhoven, D., Wells, G., Stepanenko, N., Benndorf, … SPIE - The International Society of Optical Engineering	8 国際会議録 Simulation of mask induced polarization effect on imaging in immersion lithography [6154-105] Kwak, E. A., Jung, M. R., Kim, D.-G., Lee, J.-E., Oh, H.-K., Lee, S. SPIE - The International Society of Optical Engineering
3 国際会議録 Finite element modeling of PAG leaching and water uptake in immersion lithography resist materials B. M. Rathsack, S. Scheer, Y. Kuwahara, J. Kitano, R. Gronheid Society of Photo-optical Instrumentation Engineers	9 国際会議録 Second generation fluids for 193nm immersion lithography [6154-42] French, R. H., Qiu, W., Yang, M. K., Wheland, R. C., Lemon, M. F., Shoe, A. L., Adelman, D. J., Crawford, M. K., Tran, … SPIE - The International Society of Optical Engineering
4 国際会議録 Top coat or no top coat immersion lighography? Stepanenko, N, Kim, H W, Kishimura, S, Van Den Heuvel, D, Vandenbroeck, N, Kocsis, M, Foubert, P, Maenhoudt, M, Ercken, … SPIE - The International Society of Optical Engineering	10 国際会議録 Immersion lithography robustness for the C065 node [6154-07] Warrick, S., Morton, R., Mauri, A., Chapon, J. D, Belledent, J., Conley, W., Barr, A., Lucas, K., Monget, C., Plantier, … SPIE - The International Society of Optical Engineering
5 国際会議録 Measurement and evaluation of water uptake by resists, top coats, stacks, and correlation with watermark defects P. Foubert, M. Kocsis, R. Gronheid, S. Kishimura, A. Soyano, K. Nafus, N. Stepanenko, J. D. Backer, N. Vandenbroeck, M. … SPIE - The International Society of Optical Engineering	11 国際会議録 (Lens) design for (chip) manufacture: lens tolerancing based on linewidth calculations in hyper-NA immersion lithography systems [6154-20] Gordon, R. L., Rimmer, M. P SPIE - The International Society of Optical Engineering
6 国際会議録 Studies of consequences of photo-acid generator leaching in 193-nm immersion lithography [6154-43] Liberman, V., Switkes, M., Rothschild, M., Palmacci, S. T., Grenville, A. SPIE - The International Society of Optical Engineering	12 国際会議録 Evaluation of partial coherent imaging using the transfer function in immersion lithography [6154-103] Jung, M. R., Kwak, E. A., Oh, H.-K., Shim, S.-B., Choi, N.-R., Kim, J.-S. SPIE - The International Society of Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12