Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51]

Optimizing absorber thickness of attenuating phase-shifting masks for hyper-NA Iithogra phy [6154-51]

著者名:

Yoshizawa, M. ( Sony Corp. (Japan) and IMEC (Belgium) )
Philipsen, V. ( IMEC (Belgium) )
Leunissen, L. H. A. ( IMEC (Belgium) )

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

1

開始ページ:

61541E

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

類似資料:

1 国際会議録 Comparative study of bi-layer attenuating phase-shifting masks for hyper-NA lithography [6283-123] Yoshizawa, M., Philipsen, V., Leunissen, A. H. L., Hendrickx, E., Jonckheere, R., Vandenberghe, G., Buttgereit, U., … SPIE - The International Society of Optical Engineering	7 国際会議録 Feasibility study of embedded binary masks [6349-21] Cangemi, M., Philipsen, V., Leunissen, L. H. A., Taylor, D. SPIE - The International Society of Optical Engineering
2 国際会議録 Impact of the absorber thickness variation on the imaging performance of ArF immersion lithography [5853-112] Yoshizawa, M., Philipsen, V., Leunissen, L. H. A. SPIE - The International Society of Optical Engineering	8 国際会議録 The impact of attenuated phase shift mask topography on hyper-NA lithography [5992-36] Mack, C. A., Smith, M. D., Graves, T. SPIE - The International Society of Optical Engineering
3 国際会議録 Mask substrate birefringence requirements for hyper-NA lithography [6154-159] van de Kerkhof, M., de Boeij, W., Demarteau, M., Geh, B., Leunissen, L. H. A., Martin, P., Cangemi, M. SPIE - The International Society of Optical Engineering	9 国際会議録 Through-pitch characterization and printability for 65nm half-pitch alternating aperture phase shift applications [5853-108] Philipsen, V., Leunissen, L., De Ruyter, R., Jonckheere, R., Marlin, P., Wakefield, C., Johnson, S., Cangemi, M., … SPIE - The International Society of Optical Engineering
4 国際会議録 Printability of topography in alternating aperture phase-shift masks Philipsen, V. SPIE - The International Society of Optical Engineering	10 国際会議録 Printability study for phase-shift masks at 193-nm lithography Philipsen, V., Jonckheere, R.M. SPIE-The International Society for Optical Engineering
5 国際会議録 Validity of the Hopkins approximation in simulations of hyper NA(NA>l) line-space structures for an attenuated PSM mask [6154-16] Erdmann, A., Citarella, G., Evanschitzky, P., Schermer, H., Philipsen, V., De Bisschop, P. SPIE - The International Society of Optical Engineering	11 国際会議録 TiSi-nitride-based attenuated phase-shift mask for ArF Lithography Koo,S.-S., Hur,I.-B., Koo,Y.-M., Baik,K.-H., Choi,I.-H., Kim,L.-J., Park,K.-T., Shin,C. SPIE - The International Society for Optical Engineering
6 国際会議録 Determining the transfer function of a mask fabrication process Leunissen, P. L. H. A., Philipsen, V., Jonckheere, R. M. SPIE - The International Society of Optical Engineering	12 国際会議録 Establishing a cleaning process for attenuated phase-shift masks White,T., Watson,L.J., Currington,C., Reyna,M.A. SPIE-The International Society for Optical Engineering

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