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High transmission mask technology for 45nm node imaging [6154-50]

著者名:
Conley, W. ( Freescale Semiconductor, Inc. (USA) )
Morgana, N. ( Photronics Inc. (France) )
Kasprowicz B S ( Photronics Inc. (USA) )
Cangemi M ( Photronics Inc. (USA) )
Lassiter M ( Photronics Inc. (France) )
Litt L C ( Freescale Semiconductor, Inc. (USA) )
Cangemin M ( Photronlcs. Inc. (USA) )
Cottle R ( Photronlcs. Inc. (USA) )
Wu W ( Freescale Semiconductor, Inc. (USA) )
Cobb J ( Freescale Semiconductor, Inc. (USA) )
Ham Y M ( Photronlcs. Inc. (USA) )
Lucas, K. ( Freescale Semiconductor, Inc. (France) )
Roman, B. ( Freescale Semiconductor, Inc. (USA) )
Porgler, C. ( Photronlcs. Inc. (USA) )
さらに 9 件
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
1
開始ページ:
61541D
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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1 国際会議録 High transmission mask technology for 45nm node imaging [6154-38]

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7 国際会議録 CPL mask technology for sub-100-nm contact hole imaging

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2 国際会議録 Tunable transmission phase mask options for 65/45nm node gate and contact processing

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8 国際会議録 The impact of illumination on feature fidelity for CPL mask technology

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3 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node

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4 国際会議録 Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode

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5 国際会議録 Optical properties and process impacts of high transmission EAPSM [6154-40]

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6 国際会議録 Applications of CPL mask technology for sub-65nm gate imaging

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