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Second generation fluids for 193nm immersion lithography [6154-42]

著者名:
French, R. H. ( DuPont Co. (USA) )
Qiu, W. ( DuPont Co. (USA) )
Yang, M. K. ( DuPont Co. (USA) )
Wheland, R. C. ( DuPont Co. (USA) )
Lemon, M. F. ( DuPont Co. (USA) )
Shoe, A. L. ( DuPont Co. (USA) )
Adelman, D. J. ( DuPont Co. (USA) )
Crawford, M. K. ( DuPont Co. (USA) )
Tran, H. V. ( DuPont Co. (USA) )
Feldman, J. ( DuPont Co. (USA) )
McLain, S. J. ( DuPont Co. (USA) )
Peng, S. ( DuPont Co. (USA) )
さらに 7 件
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
1
開始ページ:
615415
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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