High transmission mask technology for 45nm node imaging [6154-38]

High transmission mask technology for 45nm node imaging [6154-38]

著者名:

Conley, W. ( Freescale Semiconductor, Inc. (USA) )

Morgana, N. ( Photronics, Inc. (France) )

Kasprowicz, B. S. ( Photronics, Inc. (France) )

Cangemi, M. ( Photronics, Inc. (France) ) , ( Photronics, Inc. (USA) )

Lassiter, M. ( Photronics, Inc. (France) )

Litt, L. C. ( Freescale Semiconductor, Inc. (USA) )

Cottle, R. ( Photronics, Inc. (USA) )

Wu, W. ( Freescale Semiconductor, Inc. (USA) )

Cobb, J. ( Freescale Semiconductor, Inc. (USA) )

Ham, Y. -M. ( Photronics, Inc. (USA) )

Lucas, K. ( Freescale Semiconductor, Inc. (France) )

Roman, B. ( Freescale Semiconductor, Inc. (USA) )

Progler, C. ( Photronics, Inc. (USA) )

さらに 8 件

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

1

開始ページ:

615411

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

類似資料:

1 国際会議録 High transmission mask technology for 45nm node imaging [6154-50] Conley, W., Morgana, N., Kasprowicz B S, Cangemi M, Lassiter M, Litt L C, Cangemin M, Cottle R, Wu W, Cobb J, Ham Y M, … SPIE - The International Society of Optical Engineering	7 国際会議録 Optical properties and process impacts of high transmission EAPSM [6154-40] Ham, Y. M., Morgana, N., Sixt, P., Cangemin, M., Kasprowicz, B., Progler, C., Martin, P. SPIE - The International Society of Optical Engineering
2 国際会議録 Tunable transmission phase mask options for 65/45nm node gate and contact processing Kasprowicz, B. S., Conley, W., Ham, Y.-M., Cangemi, M. J., Morgana, N., Cottle, R., Progler, C. J., Wu, W., Litt, L. C., … SPIE - The International Society of Optical Engineering	8 国際会議録 The application of CPL reticle technology for the 0.045-mm node Conley, W., Van Den Broeke, D.J., Socha, R.J., Wu, W., Litt, L.C., Lucas, K.D., Roman, B.J., Peters, R.D., Parker, C., … SPIE - The International Society of Optical Engineering
3 国際会議録 CPL mask technology for sub-100-nm contact hole imaging Kasprowicz, B.S., Conley, W.E., Litt, L.C., Van Den Broeke, D.J., Montgomery, P.K., Socha, R.J., Wu, W., Lucas, K.D., … SPIE - The International Society of Optical Engineering	9 国際会議録 Applications of CPL mask technology for sub-65nm gate imaging Litt, L. C., Conley, W., Wu, W., Peters, R., Parker, C., Cobb, J., Kasprowicz, B. S., van den Broeke, D., Park, J. C., … SPIE - The International Society of Optical Engineering
4 国際会議録 Comparisons of 9% versus 6% transmission attenuated phase-shift mask for the 65-nm device mode Montgomery, P.K., Lucas, K.D., Litt, L.C., Conley, W., Fanucchi, E., Van Wingerden, J., Vandenberghe, G., Wiaux, V., … SPIE - The International Society of Optical Engineering	10 国際会議録 Defect printability in CPL mask technology Kuijten, J.-P., Verhappen, A., Pijnenburg, W., Conley, W., Litt, L.C., Wu, W., Montgomery, P., Roman, B.J., Kasprowicz, … SPIE - The International Society of Optical Engineering
5 国際会議録 Application of CPL reticle technology for the 65- and 50-nm node Conley, W., Broeke, D.J.V.D., Socha, R.J., Wu, W., Litt, L.C., Lucas, K., Nelson-Thomas, C.M., Roman, B.J., Chen, F., … SPIE-The International Society for Optical Engineering	11 国際会議録 A films based approach to intensity imbalance correction for 65 nm node c:PSM [5992-19] Cottle, R., Sixt, P., Lassiter, M., Cangemi, M., Martin, P., Progler, C. SPIE - The International Society of Optical Engineering
6 国際会議録 The impact of illumination on feature fidelity for CPL mask technology Kuijten, J. P., Verhappen, A., Conley, W., van de Goor, S., Litt, L., Wu, W., Lucas, K., Roman, B., Kasprowicz, B., … SPIE - The International Society of Optical Engineering	12 国際会議録 Process, design, and optical proximity correction requirements for the 65-nm device generation Lucas, K., Montgomery, P., Litt, L.C., Conley, W., Postnikov, S.V., Wu, W., Yuan, C.-M., Olivares, M., Strozewski, K., … SPIE-The International Society for Optical Engineering

1

2

3

4

5

6

7

8

9

10

11

12