Positive and negative tone double patterning lithography for 50nm flash memory [6154-37]
- 著者名:
Lim, C. M. ( Hynix Semiconductor Inc. (South Korea) ) Kim, S. M. ( Hynix Semiconductor Inc. (South Korea) ) Hwang, Y. S. ( Hynix Semiconductor Inc. (South Korea) ) Choi, J. -S. ( Hynix Semiconductor Inc. (South Korea) ) Ban, K. -D. ( Hynix Semiconductor Inc. (South Korea) ) Cho, S. -Y. ( Hynix Semiconductor Inc. (South Korea) ) Jung, J. K. ( Hynix Semiconductor Inc. (South Korea) ) Knag, E. -K. ( Hynix Semiconductor Inc. (South Korea) ) Lim, H. -Y. ( Hynix Semiconductor Inc. (South Korea) ) Kim, H. -S. ( Hynix Semiconductor Inc. (South Korea) ) Moon, S. -C. ( Hynix Semiconductor Inc. (South Korea) ) - 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 615410
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
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9
国際会議録
Resolution enhanced top anti-reflective coating materials for ArF immersion lithography [6153-74]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
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国際会議録
Patterning with spacer for expanding the resolution limit of current lithography tool [6156-27]
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |