(Lens) design for (chip) manufacture: lens tolerancing based on linewidth calculations in hyper-NA immersion lithography systems [6154-20]

(Lens) design for (chip) manufacture: lens tolerancing based on linewidth calculations in hyper-NA immersion lithography systems [6154-20]

著者名:

Gordon, R. L. ( Optical Research Associates (USA) )
Rimmer, M. P ( Optical Research Associates (USA) )

掲載資料名:

Optical Microlithography XIX

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6154

発行年:

2006

パート:

1

開始ページ:

61540K

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461971 [0819461970]

言語:

英語

請求記号:

P63600/6154

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016186
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Optical Microlithography
回次:	2006 : 19th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.21-2006.02.24

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