Experimental verification of PSM polarimetry: monitoring polarization at 193-nrn high-NA with phase-shift masks [6154-13]
- 著者名:
- Mcintyre, G. ( Univ. of California, Berkeley (USA) )
- Neureuther, A. ( Univ. of California, Berkeley (USA) )
- Slonaker, S. ( Nikon Precision Inc. (USA) )
- Vellanki, V. ( Benchmark Technologies Inc. (USA) )
- Reynolds, P. ( Benchmark Technologies Inc. (USA) )
- 掲載資料名:
- Optical Microlithography XIX
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6154
- 発行年:
- 2006
- パート:
- 1
- 開始ページ:
- 61540D
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461971 [0819461970]
- 言語:
- 英語
- 請求記号:
- P63600/6154
- 資料種別:
- 国際会議録
類似資料:
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
Society of Photo-optical Instrumentation Engineers |
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SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
4
国際会議録
PSM polarimetry: monitoring polarization at 1 93nm high-NA and immersion with phase shifting masks
SPIE - The International Society of Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE-The International Society for Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |
SPIE - The International Society of Optical Engineering |