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Immersion specific defect mechanisms: findings and recommendations for their control [6154-180]

著者名:
Kocsis, M. ( IMEC (Belgium) and Intel Corp. (USA) )
Van Den Heuvel, D. ( IMEC (Belgium) )
Gronheid, R. ( IMEC (Belgium) )
Maenhoudt, M. ( IMEC (Belgium) )
Vangoidsenhoven, D. ( IMEC (Belgium) )
Wells, G. ( IMEC (Belgium) and Texas Instruments Inc. (USA) )
Stepanenko, N. ( IMEC (Belgium) and Technologies SC300GmbH & Co. OHG (Germany) )
Benndorf, M. ( Philips Research Europe (Belgium) )
Kim, H. W ( IMEC (Belgium) and Samsung Electronics Co. Ltd. (South Kored) )
Kishimura, S. ( IMEC (Belgium) and Matsushita Electric Industrial Co. Ltd, (Japan) )
Ercken, M. ( IMEC (Belgium) )
Van Roey, F. ( IMEC (Belgium) )
O’Brien, S. ( IMEC (Belgium) and Texas Instruments Inc, (USA) )
Fyen, W. ( IMEC IMEC (Belgium) )
Foubert, P ( IMEC IMEC (Belgium) )
Moerman, R ( ASML (Netherlands) )
Streefkerk, B. ( ASML (Netherlands) )
さらに 12 件
掲載資料名:
Optical Microlithography XIX
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6154
発行年:
2006
パート:
1
開始ページ:
615409
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461971 [0819461970]
言語:
英語
請求記号:
P63600/6154
資料種別:
国際会議録

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