Molecular resists based on cholate derivatives for electron-beam lithography [6153-87]
- 著者名:
Shiono, D. ( Tokyo Ohka Kogyo Co.. Ltd. (Japan) ) Hirayama, T. ( Tokyo Ohka Kogyo Co.. Ltd. (Japan) ) Hada, H. ( Tokyo Ohka Kogyo Co.. Ltd. (Japan) ) Onodera, J. ( Tokyo Ohka Kogyo Co.. Ltd. (Japan) ) Arai, T. ( Hitachi, Ltd. (Japan) ) Yamaguchi, A. ( Hitachi, Ltd. (Japan) ) Kojima, K. ( Hitachi, Ltd. (Japan) ) Shiraishi, H. ( Hitachi, Ltd. (Japan) ) Fukuda, H. ( Hitachi, Ltd. (Japan) ) - 掲載資料名:
- Advances in Resist Technology and Processing XXIII
- シリーズ名:
- Proceedings of SPIE - the International Society for Optical Engineering
- シリーズ巻号:
- 6153
- 発行年:
- 2006
- パート:
- 2
- 開始ページ:
- 61532D
- 出版情報:
- Bellingham, Wash.: SPIE - The International Society of Optical Engineering
- ISSN:
- 0277786X
- ISBN:
- 9780819461964 [0819461962]
- 言語:
- 英語
- 請求記号:
- P63600/6153
- 資料種別:
- 国際会議録
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