Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]

Versatility in lithographic performance of advanced 193 nm contact hole resist [6153-86]

著者名:

Kudo, T. ( AZ Electronic Materials USA Corp. (USA) )

Lin, G. ( AZ Electronic Materials USA Corp. (USA) )

Lee, D. ( AZ Electronic Materials USA Corp. (USA) )

Rahman, D. ( AZ Electronic Materials USA Corp. (USA) )

Timko, A. ( AZ Electronic Materials USA Corp. (USA) )

Mckenzie, D. ( AZ Electronic Materials USA Corp. (USA) )

Anyadiegwu, C. ( AZ Electronic Materials USA Corp. (USA) )

Chiu, S. ( AZ Electronic Materials USA Corp. (USA) )

Houlihan, F. ( AZ Electronic Materials USA Corp. (USA) )

Rentkiewicz, D. ( AZ Electronic Materials USA Corp. (USA) )

Dammel, R. R. ( AZ Electronic Materials USA Corp. (USA) )

Padmanaban, M. ( AZ Electronic Materials USA Corp. (USA) )

Biafore, J. ( KLA-Tencor Corp. (USA) )

さらに 8 件

掲載資料名:

Advances in Resist Technology and Processing XXIII

シリーズ名:

Proceedings of SPIE - the International Society for Optical Engineering

シリーズ巻号:

6153

発行年:

2006

パート:

2

開始ページ:

61532C

出版情報:

Bellingham, Wash.: SPIE - The International Society of Optical Engineering

ISSN:

0277786X

ISBN:

9780819461964 [0819461962]

言語:

英語

請求記号:

P63600/6153

資料種別:

国際会議録

詳細

TDL書誌ID:	ZA00016185
シリーズID:	PA00000029
会議名:	SPIE Advanced Lithography : Advances in Resist Technology and Processing
回次:	2006 : 23th
会議開催地:	San Jose, CA, USA
会議開催年:	2006.02.20-2006.02.22

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1 国際会議録 193 nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate [6153-14] Rahman, M D, Chakrapani, S, Anyadiegwu, C, Lin, G, Timko, A, Houlihan, F, Rentkiewicz, D, Kudo, T, McKenzie, D, Dammel, … SPIE - The International Society of Optical Engineering	7 国際会議録 Some non-resist component contributions to LER and LWR in 193-nm lithography T. Kudo, S. Chakrapani, G. Lin, C. Anyadiegwu, C. Antonio, D. Parthasarathy, R. R. Dammel, M. Padmanaban SPIE - The International Society of Optical Engineering
2 国際会議録 Study of the effect of amine additives on LWR and LER [6153-44] Houlihan, F. M., Rentkiewicz, D., Lin, G., Rahman, D., Mackenzie, D., Timko, A., Kudo, T., Anyadiegwu, C., Thiyagarajan, … SPIE - The International Society of Optical Engineering	8 国際会議録 Performance of imide and methide onium PAGs in 193-nm resist formulations Padmanaban, M., Dammel, R.R., Lee, S.H., Kim, W.-K., Kudo, T., McKenzie, D.S., Rahman, D. SPIE-The International Society for Optical Engineering
3 国際会議録 PEB sensitivity studies of ArF resists: II. Polymer and solvent effects Hong, C.-S., Lee, S.-H., Kim, W.-K., Kudo, T., Timko, A., Mckenzie, D., Anyadiegwu, C., Rahman, D.M., Lin, G., Dammel, … SPIE - The International Society of Optical Engineering	9 国際会議録 E-beam curing effects on the etch and CD-SEM stability of 193-nm resists Padmanaban, M., Alemy, E., Dammel, R.R., Kim, W.-K., Kudo, T., Lee, S.-H., McKenzie, D.S., Orsi, A., Rahman, D., Chen, … SPIE-The International Society for Optical Engineering
4 国際会議録 Performanc of dry resist under wet conditions [6153-07] Padmanaban, M, Romano, A, Lin, G., Chiu, S, Timko, A, Houlihan, F, Rahman, D, Chakrapani, S, Kudo, T, Dammel, R. R., … SPIE - The International Society of Optical Engineering	10 国際会議録 CD changes of 193-nm resists during SEM measurement Kudo,T., Bae,J.-B., Dammel,R.R., Kim,W.-K., McKenzie,D.S., Rahman,M.D., Padmanaban,M., Ng,W. SPIE-The International Society for Optical Engineering
5 国際会議録 PEB sensitivity studies of ArF resist Lee, S.H., Kim, W.-K., Rahman, D.M., Kudo, T., Timko, A., Anyadiegwu, C., McKenzie, D.S., Kanda, T., Dammel, R.R., … SPIE-The International Society for Optical Engineering	11 国際会議録 Spin-on tri-layer approaches to high NA 193-nm lithography D. J. Abdallah, D. McKenzie, A. Timko, A. Dioses, F. Houlihan, D. Rahman, S. Miyazaki, R. Zhang, W. Kim, H. Wu, L. … SPIE - The International Society of Optical Engineering
6 国際会議録 Illumination, acid diffusion, and process optimization considerations for 193-nm contact hole resists Kudo, T., Alemy, E.L., Dammel, R.R., Kim, W.-K., Lee, S.-H., Masuda, S., McKenzie, D.S., Rahman, M.D., Romano, A.R., … SPIE-The International Society for Optical Engineering	12 国際会議録 High-performance 193-nm resist composition using hybrid copolymers of cycloolefin/maleic anhydride (COMA)/methacrylate Rahman, M.D., Alemy, E., Conley, W., Miller, D., Dammel, R.R., Kim, W.-K., Kudo, T., Lee, S.-H., Masuda, S., McKenzie, … SPIE-The International Society for Optical Engineering

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