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Characteristics of low Eo 193-nm Chemical amplification resists [6153-82]

著者名:
Ogata, T ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Kinoshita, Y ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Furuya, S ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Matsumaru, S ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Takahashi, M ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Shiono, D ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Dazai, T ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Hada, H ( Tokyo Ohka Kogyo Co. Ltd. (Japan) )
Shirai, M ( Osaka Prefecture Univ (Japan) )
さらに 4 件
掲載資料名:
Advances in Resist Technology and Processing XXIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6153
発行年:
2006
パート:
1
開始ページ:
615328
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
言語:
英語
請求記号:
P63600/6153
資料種別:
国際会議録

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