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Molecular glass resists for next-generation lithography [6153-50]

著者名:
Bratton, D. ( Cornell Univ. (USA) )
Ayothi, R. ( Cornell Univ. (USA) )
Felix, N. ( Cornell Univ. (USA) )
Cao, H. ( Intel Corp. (USA) )
Deng, H. ( Intel Corp. (USA) )
Ober, C. K. ( Cornell Univ. (USA) )
さらに 1 件
掲載資料名:
Advances in Resist Technology and Processing XXIII
シリーズ名:
Proceedings of SPIE - the International Society for Optical Engineering
シリーズ巻号:
6153
発行年:
2006
パート:
1
開始ページ:
61531D
出版情報:
Bellingham, Wash.: SPIE - The International Society of Optical Engineering
ISSN:
0277786X
ISBN:
9780819461964 [0819461962]
言語:
英語
請求記号:
P63600/6153
資料種別:
国際会議録

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